Chien-Chin Chiu

Title: Innovations of Chien-Chin Chiu in Vapor Deposition Technology.

Introduction

Chien-Chin Chiu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of vapor deposition technology. His innovative designs have the potential to enhance the efficiency and effectiveness of vapor deposition processes.

Latest Patents

Chiu holds a patent for a "Reaction chamber for vapor deposition apparatus." This invention features a susceptor to carry substrates, a ceiling, an upper cavity, and protrusions. The ceiling is designed with a front surface that faces the substrates, incorporating front convex and concave parts arranged in an interlaced manner to create a convex-concave surface. The rear surface of the ceiling corresponds to the front surface and includes rear convex and concave parts. The upper cavity is separated from the rear convex parts to define a first flow channel, while the protrusions in the rear concave parts create a second flow channel for introducing a cooling fluid. This innovative design aims to improve the performance of vapor deposition apparatuses.

Career Highlights

Chien-Chin Chiu is associated with Hermes-Epitek Corporation, where he applies his expertise in vapor deposition technology. His work has contributed to advancements in the field, showcasing his commitment to innovation and excellence.

Collaborations

Chiu has collaborated with notable colleagues, including Yu-Sheng Liang and Tsan-Hua Huang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Chien-Chin Chiu's contributions to vapor deposition technology through his innovative patent demonstrate his role as a significant inventor in the field. His work continues to influence advancements in vapor deposition processes, showcasing the importance of innovation in technology.