Koriyama, Japan

Chieko Nakagawa

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chieko Nakagawa. Retrieved from https://idiyas.com/inventor/chieko-nakagawa-mrbyhcpe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chieko Nakagawa: Innovator in Fullerene Derivatives

Chieko Nakagawa is a prominent inventor based in Koriyama, Japan. She has made significant contributions to the field of chemistry, particularly in the development of fullerene derivatives. Her innovative work has garnered attention in both academic and industrial circles.

Latest Patents

Chieko Nakagawa holds a patent for a fullerene derivative and its production method. The patent describes a fullerene derivative characterized by a specific partial structure, as outlined in General Formula (1). In this formula, the C*'s represent adjacent carbon atoms that form a fullerene framework. The components Rf and Rf each independently denote a perfluoroalkyl group containing 1 to 4 carbon atoms. Additionally, Rf and Rf may be linked to create a ring structure. This invention showcases her expertise in the synthesis of complex chemical compounds.

Career Highlights

Chieko Nakagawa is affiliated with Mitsubishi Corporation, where she applies her knowledge and skills to advance research and development in her field. Her work at the company has allowed her to collaborate with other experts and contribute to innovative projects that push the boundaries of current scientific understanding.

Conclusion

Chieko Nakagawa is a trailblazer in the realm of fullerene derivatives, with a patent that highlights her innovative spirit and technical expertise. Her contributions to the field continue to inspire future research and development in chemistry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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