Company Filing History:
Years Active: 2002
Title: The Innovative Contributions of Chieh-Ming Wang
Introduction
Chieh-Ming Wang, based in Hsinchu Hsien, Taiwan, is a prominent inventor known for his significant contributions to the semiconductor industry. With a total of two patents to his name, Wang has demonstrated creativity and technical expertise that play a crucial role in advancing semiconductor technology.
Latest Patents
Wang's latest patents include a groundbreaking process for increasing the line width window in a semiconductor process and a method for improving photoresist profiles. The first patent details a process suitable for enhancing the line width during the exposure of an iso-line pattern at a resolution of 0.13 µm. This innovative method begins with the formation of a positive photoresist layer on a substrate, followed by a precise exposure through a specially designed photomask. The design utilizes key features such as opaque main lines and strategically placed scattering bars, allowing for improved exposure outcomes.
His second patent focuses on a method for enhancing photoresist profiles, which involves a hard bake process that modifies the photoresist layer after development. This process can either be conducted at a temperature lower than the glass transition temperature or through a two-step baking method that optimizes the flow and profile of the photoresist. Together, these patents exemplify Wang's contribution toward refining semiconductor manufacturing techniques.
Career Highlights
Chieh-Ming Wang is currently employed at United Microelectronics Corporation, where he applies his extensive knowledge in semiconductor processes. His innovative approaches have propelled the company forward in the highly competitive semiconductor landscape. His ability to develop patented technologies showcases his commitment to advancing the field and the practical applications of his work.
Collaborations
Throughout his career, Wang has collaborated with notable colleagues, including Anseime Chen and I-Hsiung Huang. These collaborations have fostered an environment of innovation and shared expertise, leading to advancements in semiconductor technology that bolster the capabilities of United Microelectronics Corporation.
Conclusion
Chieh-Ming Wang stands as a figure of innovation and inspiration within the semiconductor field. With his two patents and ongoing collaboration with esteemed coworkers, he continues to contribute significantly to this vital industry. His work not only enhances manufacturing capabilities but also represents a commitment to technological advancement in semiconductor processes. As Wang progresses in his career, his innovative spirit will undoubtedly lead to further breakthroughs in the years to come.