This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Chieh-Jen Cheng and EUV Mask Cleaning Innovation.
Introduction
Chieh-Jen Cheng is an inventor based in Hsinchu, Taiwan. His patent work addresses reticle cleaning within extreme ultraviolet (EUV) photolithography scanners, a process relevant to semiconductor manufacturing.
Latest Patents
The provided information lists one patent for Cheng: “System and Method for Cleaning an EUV Mask Within a Scanner.” The invention describes an EUV photolithography system with a scanner containing a reticle storage chamber, a backside inspection chamber, and a cleaning chamber. The cleaning chamber removes debris from the reticle’s backside while the reticle remains within the scanner. Cheng is credited with 1 patent.
Career Highlights
Cheng is associated with Taiwan Semiconductor Manufacturing Co., Ltd. His listed patent focuses on integrating reticle backside cleaning into the scanner environment, supporting the handling of reticles during EUV photolithography processes.
Collaborations
Yuru Huang is identified as Cheng’s coworker. The supplied information does not specify Huang’s role in the patent or the invention.
Conclusion
Chieh-Jen Cheng’s listed patent presents an in-scanner approach to removing debris from EUV reticle backsides, reflecting his contribution to semiconductor photolithography technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile