Golden, CO, United States of America

Chieh-Hui Chang

This inventor holds 1 USPTO granted patent. Top assignee: Tda Research, Inc.. Active years: 2008.


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Chieh-Hui Chang: Innovator in Electrically Conducting Materials

Introduction

Chieh-Hui Chang is an accomplished inventor based in Golden, CO (US). He has made significant contributions to the field of electrically conducting materials, showcasing his expertise through innovative patents.

Latest Patents

Chieh-Hui Chang holds a patent for "Electrically conducting materials from branched end-capping intermediates." This invention relates to a class of conducting oligomers and polymers, along with a method for their preparation. The conducting oligomers and polymers feature an end-capping group that is non-electrically conductive and contains at least one branch point. The branched end-capping groups are synthesized by first substituting the branched group on the heteroaromatic monomer, particularly at the '2' position. In the second step, the end-capping intermediate is co-polymerized with one or more additional heteroaromatic monomers to create capped conducting oligomers and polymers. Chieh-Hui Chang has 1 patent to his name.

Career Highlights

Chieh-Hui Chang is associated with Tda Research, Inc., where he applies his knowledge and skills in the development of advanced materials. His work has contributed to the advancement of conducting materials, which have various applications in electronics and other fields.

Collaborations

Chieh-Hui Chang has collaborated with notable colleagues, including Silvia DeVito Luebben and Shawn Sapp. These collaborations have fostered innovation and the exchange of ideas in their respective fields.

Conclusion

Chieh-Hui Chang is a prominent inventor whose work in electrically conducting materials has paved the way for advancements in technology. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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