Company Filing History:
Years Active: 2022
Title: Innovations of Chieh-Hsi Chuang
Introduction
Chieh-Hsi Chuang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to semiconductor structures.
Latest Patents
One of his latest patents is titled "Semiconductor structure having a Si substrate heterointegrated with GaN and method for fabricating the same." This invention discloses a method that utilizes a (100) silicon substrate to fabricate a hundred nanometer scale hole. The process involves wet etching to expose the (111) crystal surface of the silicon substrate, which serves as a nucleating crystal surface for an AlN buffer layer and GaN. The method allows for the adjustment of doping silicon atoms into GaN, resulting in a semiconductor structure that integrates a Si substrate with GaN.
Another notable patent is "Silicon metal-oxide-semiconductor field effect transistor (Si MOSFET) with a wide-bandgap III-V compound semiconductor group drain and method for fabricating the same." This invention describes a method for fabricating a silicon MOSFET that features a wide-bandgap III-V compound semiconductor drain. The technique also involves creating a hundred nanometer-scale hole in a (100) silicon substrate to expose the (111) facet, facilitating the selective area growth of high-quality lattice matched III-V materials.
Career Highlights
Chieh-Hsi Chuang is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in semiconductor technologies. His work has garnered attention for its potential applications in various electronic devices.
Collaborations
Chieh-Hsi Chuang has collaborated with notable colleagues, including Edward Yi Chang and Jessie Lin, contributing to the advancement of semiconductor research and development.
Conclusion
Chieh-Hsi Chuang's innovative patents and contributions to semiconductor technology highlight his role as a leading inventor in the field. His work continues to influence advancements in electronic materials and devices.