Taoyuan, Taiwan

Chieh Chu

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Basf Se Corporation. Active years: 2023.


% Patents Active = 100.0


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Chieh Chu: Innovator in Cobalt Electroplating

Introduction

Chieh Chu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of electroplating, particularly with his innovative compositions for cobalt and cobalt alloy electroplating. His work has implications for various industries, including electronics and manufacturing.

Latest Patents

Chieh Chu holds a patent for a composition for cobalt or cobalt alloy electroplating. This patent includes a cobalt electroplating composition that may consist of cobalt ions and an ammonium compound of the formula (NRRRH)X. In this formula, R, R, and R can independently be hydrogen or linear or branched C1 to Calkyl, while X represents one or more n valent inorganic or organic counter ions, with n being an integer from 1 to 3. This innovative approach enhances the efficiency and effectiveness of cobalt electroplating processes.

Career Highlights

Chieh Chu is currently employed at BASF SE Corporation, a leading global chemical company. His role at BASF allows him to leverage his expertise in electroplating to develop advanced materials and solutions. His contributions have been instrumental in advancing the company's capabilities in this area.

Collaborations

Chieh has collaborated with several talented individuals in his field, including Marco Arnold and Shih Wei Chou. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in electroplating.

Conclusion

Chieh Chu is a prominent figure in the field of cobalt electroplating, with a patent that showcases his innovative approach to electroplating compositions. His work at BASF SE Corporation and collaborations with other experts highlight his commitment to advancing technology in this important area.

Profile summary based on public USPTO records.
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