Location History:
- Omiya, JP (1998)
- Saitama, JP (2008)
Company Filing History:
Years Active: 1998-2008
Title: Chie Umeyama: Innovator in Photosensitive Resins
Introduction
Chie Umeyama is a notable inventor based in Saitama, Japan. She has made significant contributions to the field of materials science, particularly in the development of photosensitive resins. With a total of 2 patents to her name, her work has implications for various applications, including optical waveguides.
Latest Patents
Umeyama's latest patents focus on innovative resin compositions. One of her patents describes a photosensitive resin that consists of a product obtained by reacting a polyester with a tetrabasic acid dianhydride and a compound containing both an ethylenically unsaturated group and an epoxy group. This resin is designed to be alkali-soluble and is further modified with a di- or tri-basic acid mono-anhydride. The resulting compositions are suitable for creating cured articles that exhibit excellent processability, transparency, and resistance to soldering heat. Another patent details a marking composition that develops a vivid white color when exposed to laser beams. This composition includes a polyolefin resin and inorganic materials such as talc and calcium carbonate, blended in specific ratios.
Career Highlights
Chie Umeyama is currently employed at Nippon Kayaku Kabushiki Kaisha, where she continues to innovate in the field of resin technology. Her work has garnered attention for its practical applications in various industries.
Collaborations
Umeyama has collaborated with notable colleagues, including Shoiti Hayashihara and Masaru Kudho, contributing to the advancement of resin technologies.
Conclusion
Chie Umeyama's contributions to the field of photosensitive resins highlight her innovative spirit and dedication to advancing material science. Her patents reflect a commitment to developing solutions that enhance processability and performance in various applications.