Company Filing History:
Years Active: 2021-2024
Title: Chibuya Siame: Innovator in Substrate Placement Accuracy
Introduction
Chibuya Siame is a notable inventor based in Marana, AZ (US). He has made significant contributions to the field of image processing and substrate alignment, holding a total of 3 patents. His work focuses on enhancing the accuracy of substrate placement, which is crucial in various technological applications.
Latest Patents
One of Chibuya Siame's latest patents is a method and system to detect substrate placement accuracy. This innovative approach utilizes image processing algorithms to measure the alignment between a substrate and the platform it is placed on. The algorithms automate the detection of edges of a microscope slide and the platform in a digital image. By employing a reference line pattern in the image of the platform, the system can effectively detect platform edges based on the computed location of the reference line pattern.
Career Highlights
Chibuya Siame is currently associated with Ventana Medical Systems, Inc., where he applies his expertise in image processing and substrate alignment. His work has been instrumental in advancing the technology used in medical diagnostics and research.
Collaborations
Chibuya collaborates with Anindya Sarkar, contributing to innovative projects that enhance the capabilities of their organization.
Conclusion
Chibuya Siame's contributions to the field of substrate placement accuracy through his patents and work at Ventana Medical Systems, Inc. highlight his role as a significant innovator in the industry. His advancements in image processing continue to impact various technological applications positively.