The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Feb. 16, 2021
Applicant:
Ventana Medical Systems, Inc., Tucson, AZ (US);
Inventors:
Anindya Sarkar, Milpitas, CA (US);
Chibuya Siame, Marana, AZ (US);
Assignee:
Ventana Medical Systems, Inc., Tucson, AZ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G06T 7/13 (2017.01); G02B 21/26 (2006.01); G02B 21/34 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
G06T 7/73 (2017.01); G02B 21/26 (2013.01); G02B 21/34 (2013.01); G02B 21/365 (2013.01); G06T 7/13 (2017.01); G06T 2207/10056 (2013.01);
Abstract
A method and system for measuring the alignment between a substrate and a platform upon which it is disposed by using image processing algorithms are described herein. These algorithms automate the detection of edges of a microscope slide and the platform in a digital image. A reference line pattern in an image of the platform can be used to detect platform edges based on a computed location of the reference line pattern in the image.