Chia-yuan Liu

Title: The Innovative Mind of Chia-yuan Liu

Introduction: Chia-yuan Liu, based in Yangmei, Taiwan, is an accomplished inventor recognized for his significant contributions to the field of electrically conductive patterns. His innovative work has led to the development of a patent that enhances manufacturing processes in various industries.

Latest Patents: Chia-yuan Liu holds a patent titled "Electrically conductive patterns with wide line-width and methods for producing same." This patent describes a master tool featuring an ink pattern created through a screen printing process. The invention involves applying a stamp-making material to the major surface of the master tool to create a stamp with a pattern that is negative to the original ink pattern. This stamped pattern is then inked and applied to a metalized surface, allowing for the formation of printed patterns on a substrate. These patterns serve as etching masks, enabling the creation of electrically conductive traces on the substrate through an etching process.

Career Highlights: Liu's career has been highlighted by his association with 3M Innovative Properties Company, where he has been able to utilize his expertise to push the boundaries of technology in conductive printing. His work not only aids in the efficiency of manufacturing but also contributes to advancements in electronics and materials science.

Collaborations: Throughout his career, Chia-yuan Liu has worked alongside talented professionals, including his coworkers Chi-fan Chen and Wan-Chun Chen. Their collaboration reflects a dynamic team approach, enhancing the creative process and driving innovation within their projects at 3M.

Conclusion: Chia-yuan Liu exemplifies the spirit of innovation through his patent and contributions to the field. His work at 3M Innovative Properties Company has paved the way for new methodologies in producing electrically conductive patterns, showcasing the importance of continuous research and development in today's technological landscape. Liu's achievements not only mark significant milestones in his career but also continue to influence the future of conductive materials and applications.