Kaohsiung, Taiwan

Chia-Yi Lu

This inventor holds 2 USPTO granted patents. Top assignee: Eternal Chemical Co., Ltd.. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Yi Lu. Retrieved from https://idiyas.com/inventor/chia-yi-lu-ncbdllnn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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2 patents (USPTO):Explore Patents

Title: The Innovations of Chia-Yi Lu

Introduction

Chia-Yi Lu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of optical technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Chia-Yi Lu's latest patents include an optical thin sheet and a high light diffusion reflector. The optical thin sheet features a substrate with a light diffusion layer on at least one side, achieving an optical property with a haze of no less than 98%. This innovation is particularly suitable for use in flat displays. His second patent pertains to a reflector that comprises a substrate capable of reflecting light, characterized by a gloss of less than 10% when a light source is projected at a 60-degree angle. This reflector allows for uniform light reflection and possesses high reflectivity.

Career Highlights

Chia-Yi Lu is currently employed at Eternal Chemical Co., Ltd., where he continues to develop and refine his inventions. His work has contributed to advancements in optical materials and technologies.

Collaborations

Chia-Yi Lu collaborates with talented individuals such as Lung-Lin Hsu and Yi-Chung Shih, enhancing the innovative capabilities of his projects.

Conclusion

Chia-Yi Lu's contributions to optical technology through his patents reflect his dedication to innovation and collaboration in the field. His work continues to influence advancements in display technologies and light diffusion materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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