Chia-Ling Lee

Title: **Innovative Contributions of Chia-Ling Lee in Plasma Treatment Technology**

Introduction

Chia-Ling Lee is a notable inventor based in Keelung, Taiwan, recognized for her contributions to the field of semiconductor manufacturing. With 1 patent to her name, she has made significant advancements in enhancing the methods used in plasma processing technology.

Latest Patents

Chia-Ling Lee’s patent, titled "Method and Apparatus for Dynamic Plasma Treatment of Bipolar ESC System," presents a novel approach for plasma etching a substrate in a plasma reactor. The method involves positioning the substrate on an electrostatic chuck inside the reactor, where a DC voltage is supplied to create an electrostatic charge on the substrate. This is followed by plasma etching and subsequently disconnecting the DC voltage while counteracting the electrostatic charge using a varying RF signal within the chamber. This innovative method showcases her expertise and dedication to improving semiconductor processing techniques.

Career Highlights

Chia-Ling Lee is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a prominent organization in the semiconductor industry. Her work has played a crucial role in optimizing plasma treatment processes, providing efficiency and effectiveness crucial for modern manufacturing standards.

Collaborations

Throughout her career, Chia-Ling Lee has collaborated with talented professionals, including her coworkers Cuker Huang and Shing-Long Lee. These partnerships highlight the importance of teamwork in driving technological innovations within the semiconductor sector.

Conclusion

Chia-Ling Lee’s contributions to the field of plasma treatment technology through her inventive methods and collaborative efforts emphasize the significance of innovation in advancing the semiconductor industry. As her patent demonstrates, the continuous pursuit of improvement and efficiency remains a vital aspect of technological progress.