This inventor holds 5 USPTO granted patents and 3 published patent applications. Top assignee: Asustek Computer Inc.. Active years: 2011-2023.
Company Filing History:
Years Active: 2011-2023
Title: Innovations of Chia-Hui Han
Introduction
Chia-Hui Han is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of measurement technology, particularly in the development of methods and devices for analyzing facial parameters. With a total of 5 patents to his name, Han continues to push the boundaries of innovation.
Latest Patents
One of his latest patents is titled "Method for measuring the frame wearing parameter and measuring device thereof." This invention provides a comprehensive method for scanning a testee's face while wearing a positioning frame. The process involves obtaining pupil positions, visual directions, and creating a 3D face model that corresponds to the positioning frame. The method calculates the back vertex distance and the angle between the lens plane line and a vertical line, which is essential for determining the pantoscopic tilt.
Another significant patent is the "Method and equipment for constructing three-dimensional face model." This method outlines a systematic approach to creating a 3D face model by obtaining front and full face information. It generates corresponding planar images and superimposes them to create a complete full face planar image, ultimately leading to the generation of a detailed 3D face model.
Career Highlights
Chia-Hui Han is currently employed at Asustek Computer Inc., where he applies his expertise in measurement technology. His work has been instrumental in advancing the company's capabilities in developing innovative products that require precise facial measurements.
Collaborations
Han collaborates with talented individuals such as Duan-Ruei Shiu and Hao-Yuan Kuo. Their combined efforts contribute to the success of their projects and the advancement of technology in their field.
Conclusion
Chia-Hui Han's innovative work in measurement technology has led to significant advancements in the field. His patents reflect a commitment to improving the accuracy and efficiency of facial parameter analysis. As he continues to innovate, his contributions will undoubtedly have a lasting impact on the industry.