Chia-Hsin Lee

Title: Chia-Hsin Lee: Innovator in High-Temperature Flow Components and Light-Concentrating Structures

Introduction

Chia-Hsin Lee is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the fields of thermal management and light concentration technologies. With a total of three patents to his name, Lee's work showcases his innovative approach to engineering challenges.

Latest Patents

Lee's latest patents include a high-temperature flow-splitting component and a light-concentrating structure with a photosensitivity enhancing effect. The high-temperature flow-splitting component is designed to operate within a specific temperature range and features an entrance channel, primary channels, and subordinate channels that manage fluid flow rates effectively. The light-concentrating structure enhances photosensitivity and consists of a substrate, buried layer, electrode layers, dielectric layer, and interconnection structure, which work together to optimize light concentration.

Career Highlights

Throughout his career, Chia-Hsin Lee has worked with prominent organizations such as the Industrial Technology Research Institute and the National Applied Research Laboratories. His experience in these institutions has allowed him to develop and refine his innovative ideas.

Collaborations

Lee has collaborated with talented individuals in his field, including Cheng-Hao Yang and Shing-Cheng Chang. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Chia-Hsin Lee is a distinguished inventor whose work in high-temperature flow components and light-concentrating structures has made a significant impact in his field. His innovative patents and collaborations reflect his commitment to advancing technology.