Chia Fu Lin

Title: Innovations by Chia Fu Lin in Metal Processing

Introduction

Chia Fu Lin is an accomplished inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of metal processing, particularly in the area of corrosion prevention. His innovative approach has the potential to enhance the durability and longevity of metal surfaces, especially in semiconductor applications.

Latest Patents

Chia Fu Lin holds a patent for the "Application of impressed-current cathodic protection to prevent metal corrosion and oxidation." This patent introduces a new method for processing metals, particularly copper, to prevent damage to exposed surfaces. The method involves applying a voltage to the exposed metal surface during semiconductor processing, which is exposed to a wet substance with a specific pH value. The voltage can be adjusted based on the pH constant of the wet substance, effectively protecting the metal surface from alkaline effects.

Career Highlights

Chia Fu Lin is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he applies his expertise in semiconductor processing and metal protection. His work has been instrumental in advancing the technology used in the semiconductor industry.

Collaborations

Chia Fu Lin has collaborated with notable colleagues, including Kai-Ming Ching and Wen-Hsiang Tseng. These collaborations have contributed to the development of innovative solutions in metal processing and corrosion prevention.

Conclusion

Chia Fu Lin's contributions to the field of metal processing through his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work not only addresses critical issues related to metal corrosion but also paves the way for future innovations in the field.