Taipei, Taiwan

Chia-Che Chiang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Nan Ya Technology Corporation. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Chia-Che Chiang in Semiconductor Fabrication

Introduction

Chia-Che Chiang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor device fabrication. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Chia-Che Chiang holds a patent for a "Wet clean process for fabricating semiconductor devices." This patent describes a method that provides a pattern collapse-free wet clean process. By utilizing post-reactive ion etching (RIE) with a fluorine-containing gas, such as CF, followed by cleaning in a single wafer cleaner (SWC) with diluted hydrofluoric acid (HF) or in a solution of ammonia and HF, this process enables the creation of substrates with multiple pattern collapse-free high aspect ratio shallow trench isolation (STI) features. He has 1 patent to his name.

Career Highlights

Chia-Che Chiang is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in improving the reliability and performance of semiconductor devices.

Collaborations

Chia-Che has collaborated with talented coworkers, including Rou-Wei Wang and Jen-I Lai. Their combined expertise contributes to the advancement of semiconductor technologies within their organization.

Conclusion

Chia-Che Chiang's contributions to semiconductor fabrication through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
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