This inventor holds 2 USPTO granted patents. Top assignees: Benq Corporation, Qisda Corporation. Active years: 2007-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007-2008
Title: Innovations by Chia-Chang Hsieh
Introduction
Chia-Chang Hsieh is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of technology, particularly in the area of air filtration and detection methods. With a total of 2 patents, Hsieh's work reflects his commitment to improving air quality and efficiency in various devices.
Latest Patents
Hsieh's latest patents include a method for detecting the cleanliness of a filter and a dust detection device for an air filter used in projectors. The first patent outlines a method that involves outputting a rotation control voltage to a fan, allowing airflow to pass through the filter. The actual rotation rate of the fan is then detected, and an actual dust value is calculated based on this rate. A dust upper limit value is defined, and the cleanliness of the filter is determined accordingly. The second patent describes a projector that includes a lamp, fan, filter, and a dust detection device. This device is designed to monitor the state of the filtered airflow, ensuring optimal performance of the projector.
Career Highlights
Chia-Chang Hsieh has worked with prominent companies such as BenQ Corporation and Qisda Corporation. His experience in these organizations has allowed him to develop innovative solutions that address real-world problems.
Collaborations
Hsieh has collaborated with various professionals in his field, including his coworker Hung-Jen Wei. These partnerships have contributed to the advancement of his inventions and the successful implementation of his ideas.
Conclusion
Chia-Chang Hsieh's contributions to technology through his patents demonstrate his innovative spirit and dedication to improving air quality. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

