Hsinchu, Taiwan

Chi-Yung Hsieh


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):

Title: The Innovations of Chi-Yung Hsieh in Thin Film Fabrication

Introduction

Chi-Yung Hsieh, an accomplished inventor based in Hsinchu, Taiwan, has made significant advancements in the field of material science. With a focused expertise in thin film technology, Hsieh holds a patent that showcases his innovative approach to creating films with varying thicknesses.

Latest Patents

Hsieh's patent, titled "Method of Fabricating Thin Film with Varying Thickness," outlines a novel technique that involves several crucial steps. This method includes providing a shadow mask with an opening, a carrier plate, and arranging a substrate on the carrier plate. Hsieh's process enables the coating of the substrate through the opening while the carrier plate rotates relative to the shadow mask. By rotating the plate, varying zones of the substrate are exposed through the arcuate portions of the opening for predetermined exposure times. This technique results in a thin film with thickness variations that directly correspond to the various exposure times applied.

Career Highlights

Chi-Yung Hsieh is affiliated with National Yang Ming Chiao Tung University, where he contributes to research and development efforts. His work at the university underlines his commitment to advancing the scientific understanding of materials and their applications in engineering.

Collaborations

Throughout his career, Hsieh has collaborated with talented colleagues, including Cheng-Sheng Huang and Yu-Chi Lin. Their joint efforts have aided in the exploration of thin film technologies and have furthered the research agenda at their institution.

Conclusion

Chi-Yung Hsieh embodies the spirit of innovation within the realm of thin film fabrication. His transformative patent not only highlights his individual prowess as an inventor but also underscores the importance of collaborative research and development in academia. As he continues his work at National Yang Ming Chiao Tung University, Hsieh remains a significant figure in the advancement of material science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…