The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Nov. 10, 2020
Applicant:

National Chiao Tung University, Hsinchu, TW;

Inventors:

Cheng-Sheng Huang, Hsinchu, TW;

Chi-Yung Hsieh, Hsinchu, TW;

Yu-Chi Lin, Taipei, TW;

Chih-Chung Wu, New Taipei, TW;

Chi-Fang Huang, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); G02B 5/28 (2006.01);
U.S. Cl.
CPC ...
C23C 14/044 (2013.01); G02B 5/285 (2013.01);
Abstract

A method of fabricating a thin film with a varying thickness includes the steps of providing a shadow mask with an opening, providing a carrier plate, arranging a substrate on the carrier plate, and coating the substrate through the opening whilst rotating the carrier plate relative to the shadow mask. A plurality of zones of the substrates is swept and exposed from arcuate portions of the opening per each turn by a plurality of predetermined exposure times, respectively. The varying thickness of the thin film corresponds to variation of the predetermined exposure times.


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