Kaohsiung, Taiwan

Chi-Shih Chen

This inventor holds 1 USPTO granted patent. Top assignee: National Yang Ming Chiao Tung University. Active years: 2024.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Chi-Shih Chen in Nanoparticle Technology

Introduction

Chi-Shih Chen is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of nanoparticle technology, particularly through his innovative methods for synthesizing iridium oxide nanoparticles. His work is essential for various applications in electronics and catalysis.

Latest Patents

Chi-Shih Chen holds a patent for a "Method for making iridium oxide nanoparticles." This method involves dissolving an iridium salt to obtain a salt-containing solution, mixing a complexing agent with the salt-containing solution to create a blend solution, and adding an oxidizing agent to the blend solution to yield a product mixture. The molar ratio of the complexing compound to the iridium salt is controlled within a predetermined range, allowing the product mixture to include iridium oxide nanoparticles. This innovative approach enhances the efficiency and effectiveness of nanoparticle production.

Career Highlights

Chi-Shih Chen is affiliated with National Yang Ming Chiao Tung University, where he conducts research and develops new technologies. His work has garnered attention in the scientific community, contributing to advancements in materials science and nanotechnology.

Collaborations

Chi-Shih Chen collaborates with esteemed colleagues, including Kuang-Chih Tso and Pu-Wei Wu. Their combined expertise fosters a productive research environment, leading to innovative solutions in their respective fields.

Conclusion

Chi-Shih Chen's contributions to the field of nanoparticle technology exemplify the importance of innovation in scientific research. His patented method for synthesizing iridium oxide nanoparticles showcases his commitment to advancing technology and improving material applications.

Profile summary based on public USPTO records.
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