Xi'An, China

Chi Nan

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi Nan. Retrieved from https://idiyas.com/inventor/chi-nan-y734f3jg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chi Nan and Context Window Augmentation

Introduction

Chi Nan is an inventor based in Xi’An, China, whose work includes a patent on improving how large language models handle text that exceeds their context-window limits. He is associated with International Business Machines Corporation and has 1 patent listed in the information provided.

Latest Patents

Chi Nan’s patent, “Task Attention Mechanism for Context Window Augmentation,” describes computer-implemented methods, systems, and program products for helping a large language model process text that is longer than its usual token limit. The method measures the input’s token length and, when it exceeds a model’s threshold, generates a logical graph that incorporates the excess tokens without eliminating any portion of the original text. The graph is then incorporated into the machine learning model.

Career Highlights

The patent reflects work at the intersection of machine learning and language-model architecture. Its approach aims to preserve information from lengthy inputs while enabling a model to work within its context-window constraints.

Collaborations

The provided information names Zhong Fang Yuan and Tong Liu as Chi Nan’s coworkers. It does not specify their roles in the patent or describe the nature of their collaboration.

Conclusion

Chi Nan’s listed patent addresses a practical challenge in large language models by proposing a task-attention approach that can incorporate text beyond a model’s token threshold without discarding the excess content.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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