This inventor holds 4 USPTO granted patents and 10 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: Innovations of Chi-Ming Tsai
Introduction
Chi-Ming Tsai is a notable inventor based in San Jose, CA, who has made significant contributions to the field of digital lithography. With a total of 4 patents to his name, Tsai's work focuses on enhancing the precision and efficiency of lithographic processes.
Latest Patents
One of his latest patents is a mura reduction method, which involves a system, methods, and a non-transitory computer-readable medium designed to reduce mura in substrate sections. This innovative approach ensures that the boundary lines of the digital lithography remain invisible. The system includes a processing unit that prints a virtual mask file provided by a controller, which is responsible for converting data into an exposure pattern for the lithographic process. The exposure pattern consists of multiple sections that interact seamlessly to enhance the quality of the printed substrate.
Another significant patent involves methods to improve the process window and resolution for digital lithography through double exposures. This method entails determining a second exposure pattern to be used alongside a first exposure pattern, utilizing either a rule-based process flow or a lithography model process flow to optimize the lithography process.
Career Highlights
Chi-Ming Tsai is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to push the boundaries of lithographic technology and contribute to advancements in the industry.
Collaborations
Throughout his career, Tsai has collaborated with talented individuals such as YingChiao Wang and Chun-chih Chuang. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Chi-Ming Tsai's contributions to digital lithography through his innovative patents demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
