Company Filing History:
Years Active: 2016
Title: Chi-Ming Liu: Innovator in Photosensitive Resin Technology
Introduction
Chi-Ming Liu is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various electronic applications. With a total of 2 patents to his name, Liu continues to push the boundaries of innovation in his industry.
Latest Patents
Liu's latest patents include a positive photosensitive resin composition and a pattern forming method. The first patent describes a positive photosensitive resin composition that comprises a novolac resin, an alkali-soluble resin, an ester of an o-naphthoquinone diazide sulfonic acid, and a solvent. This composition is designed for use in thin film transistor array substrates and liquid crystal display devices. The alkali-soluble resin is produced by polymerizing a mixture that includes an epoxy compound with at least two epoxy groups and a compound with at least one carboxylic acid group and one ethylenically unsaturated group.
The second patent focuses on a positive photosensitive resin composition and a method for forming a pattern using the same. This composition includes a novolac resin, a polysiloxane, an ortho-naphthoquinone diazide sulfonic acid ester, and a solvent. The novolac resin is synthesized by polycondensing an aldehyde compound with a xylenol compound, specifically a xylenol-type novolac resin.
Career Highlights
Chi-Ming Liu is associated with Chi Mei Corporation, where he has been instrumental in advancing the company's research and development efforts in photosensitive materials. His work has significantly impacted the production of electronic components, enhancing their efficiency and performance.
Collaborations
Liu collaborates with Chun-An Shih, a fellow innovator in the field. Together, they work on developing new technologies that improve the functionality and application of photosensitive resins.
Conclusion
Chi-Ming Liu's contributions to the field of photosensitive resin technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and their applications in modern electronics.