Location History:
- Franling, CN (2008)
- Fanling, CN (2009)
Company Filing History:
Years Active: 2008-2009
Title: **Chi Lok Wong: Innovator in Optical Sensing Technology**
Introduction
Chi Lok Wong is a prominent inventor based in Fanling, China, recognized for his contributions to the field of optical sensing technology. With a total of two patents, Wong has developed innovative solutions that push the boundaries of current measurement techniques. His work at The Chinese University of Hong Kong exemplifies his dedication to advancing research and technology in this niche.
Latest Patents
One of Chi Lok Wong's notable patents is focused on "Optical sensing devices with SPR sensors based on differential phase interrogation and measuring method using the same." This patent discloses an advanced optical sensing device that includes various components such as a light source, a beam splitter, an SPR sensor unit with a sensing surface, a detecting mechanism, and a converting unit. These components work together to transform beams from the optical device into a two-dimensional interference fringe pattern. This innovative setup allows for an extra phase shift in detection beams during SPR phase measurement, providing a significant improvement in sensitivity compared to previous techniques in the field.
Career Highlights
Throughout his career at The Chinese University of Hong Kong, Chi Lok Wong has made substantial contributions to optical engineering. His focus on SPR sensors positions him as a key figure in sensor technology, where his patented methodologies have set new benchmarks in measurement sensitivity.
Collaborations
Chi Lok Wong has worked alongside colleagues such as Ho Pui Ho and Shu Yuen Wu, with whom he has collaborated on various research projects pertaining to optical sensing technologies. These collaborations have fostered an innovative environment, leading to further advancements in the field.
Conclusion
In summary, Chi Lok Wong is a significant innovator in the realm of optical sensing, with patents that showcase his commitment to improving the accuracy and sensitivity of measurement techniques. His ongoing work at The Chinese University of Hong Kong, along with fruitful collaborations, continues to contribute to the advancement of technology in this essential area.