Company Filing History:
Years Active: 1996
Title: Innovator in Photolithography: Chi Lin
Introduction: Chi Lin is a notable inventor based in Milpitas, California, recognized for his contribution to the field of photolithography. With a keen focus on enhancing lead frame manufacturing processes, he holds a significant patent that addresses the reduction of repeated defects during production.
Latest Patents: Chi Lin's patent titled "Photolithographic process for reducing repeated defects" showcases an innovative approach to forming lead frame patterns. In this patent, he describes a method utilizing a mask that measures approximately 12 inches by 12 inches and contains two similar patterns. The first pattern, positioned over a copper web with laminated photoresist, allows for the transmission of ultraviolet light. This exposure forms the first image in the photoresist layer. The mask's movement creates a second image that overlaps the initial exposure, ultimately refining the pattern and minimizing defects caused by any particles present on the mask.
Career Highlights: Chi Lin has made significant strides in his career by working for National Semiconductor Corporation. His innovative techniques and patented processes have improved the efficiency and accuracy of photolithography in semiconductor manufacturing.
Collaborations: He has collaborated with esteemed colleagues such as Eddy Tjhia and Anjali Anagol-Subbarao, contributing to a dynamic work environment centered on innovation and excellence in engineering.
Conclusion: Chi Lin stands out as a dedicated inventor in the field of semiconductor technology. His innovative photolithographic process not only enhances production quality but also exemplifies the impact of intelligent design in manufacturing. His ongoing contributions and collaborations within National Semiconductor Corporation reflect his commitment to driving advancements in the industry.