Company Filing History:
Years Active: 2003
Title: Chi-Hei Lin: Innovator in Floating Gate Memory Technology
Introduction
Chi-Hei Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in memory devices. His innovative approach has led to the development of a unique method for forming floating gates in split-gate memory.
Latest Patents
Chi-Hei Lin holds a patent for a method of forming a poly tip of a floating gate in split-gate memory. The invention provides a method for creating a floating gate with a poly tip, which involves several steps. It begins with a semiconductor substrate that has a gate dielectric layer. A first polysilicon layer is then formed on this layer, followed by the creation of a hard mask layer. An opening is made in the hard mask to expose part of the first polysilicon layer, allowing for the formation of a poly spacer. Finally, the hard mask layer and the underlying polysilicon layer are removed to complete the floating gate structure. This innovative method enhances the performance and efficiency of memory devices.
Career Highlights
Chi-Hei Lin is currently employed at Nan Ya Technology Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of memory devices, making them more efficient and reliable.
Collaborations
Chi-Hei Lin has collaborated with several talented individuals in his field, including Yung-Meng Huang and Ching-Nan Hsiao. Their combined expertise has contributed to the success of various projects and innovations within the company.
Conclusion
Chi-Hei Lin's contributions to the field of semiconductor technology, particularly through his patent on floating gate memory, highlight his innovative spirit and dedication to advancing technology. His work at Nan Ya Technology Corporation and collaborations with fellow inventors further emphasize his impact on the industry.