Hong Kong, China

Chi Hang Yu

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Nanoshields Technology Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi Hang Yu. Retrieved from https://idiyas.com/inventor/chi-hang-yu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Chi Hang Yu

Introduction

Chi Hang Yu is a prominent inventor based in Hong Kong, CN. He is known for his innovative work in the field of protective masks made with polymer-based materials. With a focus on enhancing safety and comfort, his inventions have the potential to impact various industries.

Latest Patents

Chi Hang Yu holds a patent for protective masks made with polymer-based materials. The patent describes methods of forming interlaced polymer-based materials, which involve applying adhesive to a substrate, electrospinning a first polymer solution onto the substrate from a first group of spinning electrodes, and electrospinning a second polymer solution onto the substrate from a second group of spinning electrodes. The process concludes with applying hot air to dry the electrospun materials, resulting in effective protective masks.

Career Highlights

Chi Hang Yu has made significant strides in his career, particularly through his work at Nanoshields Technology Limited. His dedication to innovation has led to the development of advanced protective gear that addresses contemporary health and safety challenges.

Collaborations

Chi Hang Yu collaborates with talented individuals such as Siu Wah Wong and Ho Wang Tong. Their combined expertise contributes to the advancement of technology in protective equipment.

Conclusion

Chi Hang Yu's contributions to the field of protective masks exemplify the importance of innovation in enhancing public safety. His work continues to inspire advancements in material science and protective gear.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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