Chi-Chung Chang

Title: Chi-Chung Chang: Innovator in Patch Antenna Technology

Introduction

Chi-Chung Chang is a notable inventor based in Taipei Hsien, Taiwan. He has made significant contributions to the field of antenna technology, particularly in the development of patch antennas. With a total of three patents to his name, Chang's work has advanced the efficiency and functionality of these essential communication devices.

Latest Patents

Chi-Chung Chang's latest patents include innovative methods for making patch antennas. One of his patents describes a method that involves stamping a first metal plate to create a radiation metal layer, which includes a first protruding portion. Additionally, a second metal plate is stamped to form a grounding metal layer, which also has a protruding portion. These metal layers are then coupled together in a mold, with an insulation material introduced to form a dielectric layer between them. Another patent outlines a similar method, emphasizing the attachment of the radiation and grounding metal layers to opposite surfaces of a dielectric layer.

Career Highlights

Chang is currently employed at Wistron Neweb Corporation, where he continues to innovate in the field of antenna technology. His work has not only contributed to the company's advancements but has also positioned him as a key figure in the industry.

Collaborations

Some of Chi-Chung Chang's coworkers include Shih-Hong Chen and Chieh-Sheng Hsu. Their collaborative efforts have likely played a role in the successful development of various projects within the company.

Conclusion

Chi-Chung Chang's contributions to patch antenna technology demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of the complexities involved in antenna design, making him a valuable asset in the field.