Chi-Ching Pu

Title: Chi-Ching Pu: Innovator in Semiconductor Technology

Introduction

Chi-Ching Pu is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs and applications.

Latest Patents

Chi-Ching Pu holds a patent for a semiconductor device. This device includes a substrate, a first III-V compound layer, a gate electrode, drain trenches, and at least one drain electrode. The design features drain trenches that are disposed and arranged with high integrity. The substrate has a first side and a second side opposite to the first side. The first III-V compound layer is positioned at the first side of the substrate, while the gate electrode is placed on this layer. Each drain trench extends from the second side of the substrate toward the first side and penetrates the substrate, with the trenches arranged regularly. The drain electrode is located in at least one of the drain trenches. Chi-Ching Pu has 1 patent to his name.

Career Highlights

Chi-Ching Pu is currently associated with Glc Semiconductor Group Co., Ltd., where he continues to advance semiconductor technology. His work has been instrumental in developing efficient semiconductor devices that meet modern technological demands.

Collaborations

Chi-Ching Pu collaborates with Shun-Min Yeh, a talented woman in the field, contributing to innovative projects and research in semiconductor technology.

Conclusion

Chi-Ching Pu's contributions to semiconductor technology highlight his role as an innovator in the field. His patent and ongoing work at Glc Semiconductor Group Co., Ltd. demonstrate his commitment to advancing technology.