The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Jul. 23, 2019
Applicant:

Glc Semiconductor Group (Cq) Co., Ltd., Chongqing, CN;

Inventors:

Chi-Ching Pu, Hsinchu County, TW;

Shun-Min Yeh, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); H01L 29/08 (2006.01); H01L 29/40 (2006.01); H01L 21/02 (2006.01); H01L 29/20 (2006.01); H01L 29/423 (2006.01); H01L 29/778 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66712 (2013.01); H01L 21/02505 (2013.01); H01L 29/0882 (2013.01); H01L 29/2003 (2013.01); H01L 29/401 (2013.01); H01L 29/41741 (2013.01); H01L 29/4236 (2013.01); H01L 29/66522 (2013.01); H01L 29/7788 (2013.01); H01L 29/7827 (2013.01);
Abstract

A semiconductor device includes a substrate, a first III-V compound layer, a gate electrode, drain trenches, and at least one drain electrode. The drain trenches are disposed and arranged with high integrity. The substrate has a first side and a second side opposite to the first side. The first III-V compound layer is disposed at the first side of the substrate. The gate electrode is disposed on the first III-V compound layer. Each of the drain trenches extends from the second side of the substrate toward the first side of the substrate and penetrates the substrate. The drain trenches are arranged regularly. The drain electrode is disposed in at least one of the drain trenches.


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