Company Filing History:
Years Active: 2003
Title: Innovations by Chi-Bing Chen in Ion Implantation Technology
Introduction
Chi-Bing Chen is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in ion implantation technology. His innovative approach addresses critical challenges in the industry, showcasing his expertise and dedication to advancing technology.
Latest Patents
Chi-Bing Chen holds a patent for a method aimed at reducing the effects of N2 gas contamination in an ion implanter. This patent outlines a comprehensive method for minimizing dinitrogen (N2) ion concentration during the ion implantation process. The method involves utilizing an ion source chamber surrounded by source magnets, providing a gaseous source of material for ionization, and adjusting the current supply to optimize the ratio of dinitrogen ions to nitrogen ions for implantation.
Career Highlights
Chi-Bing Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the efficiency and effectiveness of ion implantation processes, which are crucial for semiconductor fabrication. His innovative solutions have the potential to improve the overall quality and performance of semiconductor devices.
Collaborations
Chi-Bing Chen collaborates with talented colleagues, including Su-Yu Yeh and Cheng-Yi Huang. Together, they contribute to the advancement of semiconductor technologies and work on various projects that aim to push the boundaries of innovation in the field.
Conclusion
Chi-Bing Chen's contributions to ion implantation technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and ongoing work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key player in advancing technology.