Chevan Goonetilleke

Title: Chevan Goonetilleke: Innovator in Plasma Technology

Introduction

Chevan Goonetilleke is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of plasma technology, particularly in the area of photoresist removal processes. His innovative approach has garnered attention in the semiconductor industry.

Latest Patents

Goonetilleke holds a patent for a "Method for removing photoresist from low-k films in a downstream plasma system." This unique photoresist strip sequence utilizes a downstream plasma system, which can include RF directional plasma alone, downstream plasma alone, or a combination of both. The process can be executed in a single step or multiple steps, achieving high strip rates while preserving the dielectric properties of the film. The method is characterized by an oxidizing process conducted at low temperature and low pressure, minimizing the reactivity of oxygen with the low-k film. Additionally, the incorporation of a small percentage of an additive gas, such as a fluorine-containing gas, aids in the removal of inorganic residues, resulting in a clean film devoid of photoresist and residue.

Career Highlights

Chevan Goonetilleke is currently employed at Novellus Systems Incorporated, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processes in semiconductor manufacturing.

Collaborations

Goonetilleke has collaborated with notable colleagues, including Kirk J. Ostrowski and Senzi Li. These partnerships have contributed to the successful development and implementation of innovative technologies in their field.

Conclusion

Chevan Goonetilleke's contributions to plasma technology and his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the methods used in photoresist removal processes, showcasing the importance of innovation in technology.