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For the Inventor, By the Inventor

Coventry, RI, United States of America

Chester J Sobodacha

This inventor holds 11 USPTO granted patents. Top assignee: Hoechst Celanese Corporation. Active years: 1988-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chester J Sobodacha. Retrieved from https://idiyas.com/inventor/chester-j-sobodacha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 66(Granted Patents)


Company Filing History:

goldMedal11 out of 1,194 
 
Hoechst Celanese Corporation
 patents

Years Active: 1988-1997

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11 patents (USPTO):Explore Patents
1. 5646218 - Novolak resin blends for photoresist applications (1997-07-08),
2. 5374693 - Novolak resin blends for photoresist applications (1994-12-20),
3. 5348842 - Method for producing positive photoresist image utilizing diazo ester of (1994-09-20),
4. 5248585 - Polyphosphazene binder resins for photoresists comprising as (1993-09-28),
5. 5221592 - Diazo ester of a benzolactone ring compound and positive photoresist (1993-06-22),
6. 5162510 - Process for the preparation of photosensitive compositions containing a (1992-11-10),
7. 5035976 - Photosensitive article having phenolic photosensitizers containing (1991-07-30),
8. 4902785 - Phenolic photosensitizers containing quinone diazide and acidic halide (1990-02-20),
9. 4892801 - Mixed ester O-quinone diazide photosensitizers and process of preparation (1990-01-09),
10. 4732837 - Novel mixed ester O-quinone photosensitizers (1988-03-22),
11. 4732836 - Novel mixed ester O-quinone photosensitizers (1988-03-22),

Title: The Innovations of Chester J Sobodacha

Introduction

Chester J Sobodacha is a notable inventor based in Coventry, Rhode Island, with a remarkable portfolio of 11 patents. His work primarily focuses on advancements in resin technology, particularly in the field of photoresist applications.

Latest Patents

One of his latest patents involves novolak resin blends for photoresist applications. This invention relates to a water-insoluble, aqueous alkali-soluble novolak resin blend. The resin blend comprises two novolaks that have dissimilar relative molecular weights and similar dissolution rates. Additionally, the patent outlines a process for producing such a resin blend, a photoresist containing this resin blend, and a method for producing a semiconductor device utilizing the photoresist.

Career Highlights

Chester J Sobodacha has made significant contributions to the field of materials science through his innovative patents. His work at Hoechst Celanese Corporation has positioned him as a key player in the development of advanced materials for semiconductor applications.

Collaborations

Throughout his career, Chester has collaborated with notable colleagues, including Robert E Potvin and Jonas O St Alban. These partnerships have further enhanced the impact of his inventions in the industry.

Conclusion

Chester J Sobodacha's contributions to resin technology and photoresist applications demonstrate his commitment to innovation and excellence in his field. His patents continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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