Santa Cruz, CA, United States of America

Chester A Szwejkowski

This inventor holds 4 USPTO granted patents. Top assignees: Applied Materials, Inc., Seiko Epson Corporation. Active years: 1992-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chester A Szwejkowski. Retrieved from https://idiyas.com/inventor/chester-a-szwejkowski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 168(Granted Patents)


Location History:

  • Palisades, NY (US) (1992 - 1994)
  • Santa Cruz, CA (US) (1993 - 1994)

Company Filing History:


Years Active: 1992-1994

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovations of Chester A. Szwejkowski: A Leader in Semiconductor Etching Processes

Introduction

Chester A. Szwejkowski is a prominent inventor based in Santa Cruz, California, known for his contributions to semiconductor etching processes. With a total of four patents to his name, Szwejkowski has made significant advancements in materials processing technology, particularly in the area of tungsten silicide etching. His innovative approaches have strengthened the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of Szwejkowski's latest patents describes a "Tungsten Silicide Etch Process Selective to Photoresist and Oxide." This groundbreaking process involves etching tungsten silicide on a semiconductor wafer within a vacuum etch chamber using a plasma. The method employs chlorine (Cl.sub.2) and oxygen-bearing etchant gases at a controlled ratio, enhancing selectivity for both photoresist and oxide materials. Szwejkowski has also developed a process for the "Removal of Residues Remaining After Etching Polysilicon." This improvement allows for the effective removal of polymerized silicon/oxide-containing residues while preserving the integrity of the remaining polysilicon, showcasing his commitment to advancing technology in semiconductor manufacturing.

Career Highlights

Chester A. Szwejkowski has leveraged his expertise while working at reputable organizations such as Applied Materials, Inc. and Seiko Epson Corporation. His work has significantly contributed to the innovative practices in these leading companies focused on semiconductor technology.

Collaborations

Throughout his career, Szwejkowski has collaborated with esteemed professionals in his field, including Ian Scot Latchford and Isamu Namose. These partnerships have facilitated knowledge sharing and have been pivotal in enhancing semiconductor processing techniques.

Conclusion

Chester A. Szwejkowski's work in the semiconductor industry has led to remarkable advancements in etching processes. His patents reflect a deep understanding of materials and their applications, ensuring ongoing innovation in semiconductor manufacturing. Szwejkowski's contributions continue to influence the field and serve as a testament to the vital role of inventors in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…