Seoul, South Korea

Cheong-Sik Yu

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2011-2015

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4 patents (USPTO):Explore Patents

Title: The Innovations of Cheong-Sik Yu

Introduction

Cheong-Sik Yu is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest patents is a semiconductor device that includes work function control film patterns and a method for fabricating the same. This innovative semiconductor device features a substrate with distinct regions, each equipped with high-k dielectric film patterns. The design incorporates first and second work function control film patterns that are strategically positioned to optimize device performance. Another notable patent involves a semiconductor device comprising at least one SRAM cell, which includes various transistors with differing inversion-layer thicknesses. This advancement aims to improve the functionality and reliability of semiconductor devices.

Career Highlights

Cheong-Sik Yu is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor innovation, contributing to the company's reputation for excellence in electronics.

Collaborations

Throughout his career, Cheong-Sik Yu has collaborated with talented individuals such as Choel-Hwyi Bae and Ju-Youn Kim. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Cheong-Sik Yu's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving electronic devices. His work continues to influence the industry and inspire future innovations.

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