Seoul, South Korea

Cheolhong Kim

This inventor holds 1 USPTO granted patent. Top assignee: Hctm Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cheolhong Kim. Retrieved from https://idiyas.com/inventor/cheolhong-kim-c1two8xn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Cheolhong Kim: Innovator in Particle Measurement Technology

Introduction

Cheolhong Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of particle measurement technology. His innovative approach has led to the development of a unique particle measuring system that enhances measurement accuracy and convenience.

Latest Patents

Cheolhong Kim holds a patent for a particle measuring system that includes two drying units. One drying unit is designed to dry fine particles, while the other serves to regenerate a dehumidifying agent. This system allows the dehumidifying agent to be used semi-permanently without the need for replacement. The design improves the continuity and accuracy of measurement results, making it a valuable advancement in the field.

Career Highlights

Cheolhong Kim is associated with Hctm Co., Ltd., where he applies his expertise in developing innovative solutions. His work has garnered attention for its practical applications and effectiveness in improving measurement systems.

Collaborations

Cheolhong Kim collaborates with talented individuals such as Hongku Lee and Jeongsuk Choi. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Cheolhong Kim's contributions to particle measurement technology exemplify the impact of innovation in enhancing measurement accuracy and convenience. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…