Suwon, South Korea

Cheol-heui Park

This inventor holds 1 USPTO granted patent. Top assignees: Samsung Electronics Co., Ltd., Sungkyunkwan University. Active years: 2024.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Cheol-heui Park: Innovator in Fan-out Buffer Technology

Introduction

Cheol-heui Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of electronics, particularly in the development of innovative buffering technologies. His work has led to advancements that enhance the performance and reliability of electronic devices.

Latest Patents

Cheol-heui Park holds a patent for a "Fan-out buffer with skew control function, operating method thereof, and probe card including the same." This invention discloses a fan-out buffer that features a first channel with a delay circuit to adjust the delay time of a calibration test signal. It also includes a second channel with a similar delay circuit, edge-to-pulse converters, and a stop pulse signal generator. This technology is crucial for improving signal integrity in high-speed electronic applications.

Career Highlights

Throughout his career, Cheol-heui Park has worked with prominent organizations such as Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to collaborate on various projects that push the boundaries of electronic engineering.

Collaborations

Cheol-heui Park has collaborated with talented individuals in his field, including Byung-Sung Kim and Yun-hyok Choi. These partnerships have contributed to the successful development of innovative technologies and solutions.

Conclusion

Cheol-heui Park is a distinguished inventor whose work in fan-out buffer technology has made a significant impact on the electronics industry. His contributions continue to influence advancements in electronic design and performance.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…