Company Filing History:
Years Active: 1998
Title: The Innovative Work of Inventor Chenjie Wang
Introduction: Chenjie Wang is an accomplished inventor based in Livingston, NJ, whose innovative contributions to the field of UV absorbents mark a significant advancement in material science. Known for his creativity and expertise, Wang holds a unique patent that demonstrates his ability to devise practical solutions for modern challenges.
Latest Patents: Chenjie Wang's most notable patent, titled "Photostable UV absorbent containing A-cyano cinnamyl moiety," focuses on a photostable UV absorbent characterized by a maximum absorption above 340 nm. The patent showcases a specific formula that includes components where R can be --CO(R.sub.2) or phenyl, which may be optionally substituted with lower alkyl and/or lower alkoxy groups. This innovation plays an essential role in enhancing the durability and effectiveness of UV protective materials.
Career Highlights: Wang is currently employed at Isp Investments Inc., a company recognized for its commitment to developing advanced chemical solutions. His work contributes to the ongoing research and development efforts at the firm, pushing the boundaries of what is possible in UV protection technology.
Collaborations: Throughout his career, Chenjie Wang has collaborated with notable professionals in his field, including Ratan K Chaudhuri and Janusz Z Jachowicz. These partnerships have fostered a dynamic exchange of ideas, leading to impactful developments in their respective areas of expertise.
Conclusion: Chenjie Wang's innovative spirit and dedication to invention continue to make a difference in the world of UV absorbents. His patent serves as a testament to the importance of creativity and collaboration in driving technological advancements that benefit both industry and society.