Beijing, China

Chengyue Yang


Average Co-Inventor Count = 5.9

ph-index = 1


Company Filing History:


Years Active: 2020-2022

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5 patents (USPTO):Explore Patents

Title: Chengyue Yang: Innovator in Semiconductor Technology

Introduction

Chengyue Yang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods and devices that enhance the performance and efficiency of semiconductor components.

Latest Patents

One of his latest patents is a semiconductor device and preparation method thereof. This patent discloses a semiconductor device that includes an N+ substrate with multiple openings formed in the back surface. It features an N− epitaxial layer that comprises an active area with P++ area rings and groove structures. Additionally, it includes a terminal area with an N+ field stop ring and P+ guard rings, along with a Schottky contact and a passivation layer.

Another notable patent is a method for manufacturing a grooved MOSFET device based on two-step microwave plasma oxidation. This method involves etching a grooved gate and oxidizing silicon carbide to form a grooved-gate oxide layer. The process includes precise control of temperature and pressure during the oxidation stages to achieve the desired thickness of silicon dioxide.

Career Highlights

Chengyue Yang has worked with esteemed organizations such as the Chinese Academy of Sciences and Zhuzhou CRRC Times Electric Co., Ltd. His experience in these institutions has allowed him to develop and refine his innovative approaches to semiconductor technology.

Collaborations

Throughout his career, Chengyue has collaborated with talented individuals, including Yidan Tang and Xinyu Liu. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Chengyue Yang is a distinguished inventor whose work in semiconductor technology has led to multiple patents and innovative methods. His contributions continue to impact the field significantly, showcasing his expertise and dedication to advancing technology.

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