ChengYen Liu

Title: ChengYen Liu: Innovator in Photographic Mask Technology

Introduction

ChengYen Liu is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of photographic mask technology. His innovative approach has led to the development of a unique patent that enhances the manufacturing process of photographic masks.

Latest Patents

ChengYen Liu holds a patent for a "Photographic mask and method for making same." This invention includes a silicon-on-insulator (SOI) base and a stepped opening formed in the SOI base. The SOI base consists of a silicon substrate, a median layer, and a silicon layer, with the median layer positioned between the insulator substrate and the insulator layer. The stepped opening features a first opening portion that penetrates through the silicon layer and has a first opening area, while the second opening portion at least penetrates through the silicon substrate and aligns with the first opening portion. Notably, the second opening portion has a second opening area greater than that of the first opening portion. This patent represents a significant advancement in the field.

Career Highlights

ChengYen Liu is currently employed at Aac Acoustic Technologies (Shenzhen) Co., Ltd. His work at this company has allowed him to focus on innovative solutions in acoustic technologies and related fields. His expertise and dedication have positioned him as a key player in his industry.

Collaborations

ChengYen Liu collaborates with talented individuals such as Linlin Wang and Ye Zhou. Their teamwork fosters an environment of creativity and innovation, contributing to the success of their projects.

Conclusion

ChengYen Liu is a noteworthy inventor whose contributions to photographic mask technology are commendable. His patent and work at Aac Acoustic Technologies highlight his commitment to innovation and excellence in his field.