Xiamen, China

Chengjun Zhang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Xiamen Silan Advanced Compound Semiconductor Co., Ltd. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chengjun Zhang. Retrieved from https://idiyas.com/inventor/chengjun-zhang-8d2d2wh9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chengjun Zhang and Semiconductor Light-Emitting Technology.

Introduction

Chengjun Zhang is an inventor based in Xiamen, China, associated with Xiamen Silan Advanced Compound Semiconductor Co., Ltd. His patent work concerns semiconductor light-emitting devices and methods for manufacturing them.

Latest Patents

Zhang is credited with 1 patent: “Semiconductor Light Emitting Element and Manufacture Method Thereof.” The invention describes a device built from a substrate, n-type semiconductor layer, quantum well layer, and p-type semiconductor layer. It also incorporates surface-plasmon-related layers in specified positions within or above the semiconductor structure. The patent presents these arrangements as a way to improve quantum efficiency, light-emission uniformity, and resistance to electrostatic discharge.

Career Highlights

Zhang’s listed patent reflects work in compound-semiconductor technology, particularly the design and manufacture of light-emitting elements. His association with Xiamen Silan Advanced Compound Semiconductor Co., Ltd. connects his inventive work with a company focused on advanced semiconductor materials and devices.

Collaborations

Jinjian Zheng and Moran Gao are identified as Zhang’s coworkers. The available information does not specify their roles in the patent or describe particular joint projects.

Conclusion

Chengjun Zhang’s recorded invention focuses on improving the efficiency, uniformity, and durability of semiconductor light-emitting elements through surface-plasmon-related layer arrangements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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