Company Filing History:
Years Active: 2015
Title: Chengjian Fan: Innovator in Silicon Wet Etching Technology
Introduction
Chengjian Fan is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of silicon wet etching technology. His innovative approach has led to the development of a unique monitoring structure and method that enhances the accuracy of etching depth measurements.
Latest Patents
Chengjian Fan holds a patent for a "Monitoring structure and monitoring method for silicon wet etching depth." This invention provides a monitoring structure that includes a wet etched groove formed on a monocrystalline silicon material. The structure features at least two top surfaces that are rectangular, with specific width measurements defined by the formulae W=d/0.71. The method involves performing anisotropic wet etching on a silicon wafer according to a monitoring pattern, allowing for low-cost monitoring with high accuracy.
Career Highlights
Chengjian Fan is associated with Csmc Technologies Fab2 Co., Ltd., where he applies his expertise in silicon technology. His work focuses on improving the efficiency and precision of silicon etching processes, which are critical in semiconductor manufacturing.
Collaborations
Chengjian Fan collaborates with talented individuals such as Xinwei Zhang and Changfeng Xia. Their combined efforts contribute to advancements in silicon technology and etching methods.
Conclusion
Chengjian Fan's innovative contributions to silicon wet etching technology demonstrate his commitment to enhancing manufacturing processes. His patent reflects a significant advancement in monitoring etching depth, showcasing his expertise in the field.