Cheng-Ying Yen

Title: Cheng-Ying Yen: Innovator in Semiconductor Fabrication

Introduction

Cheng-Ying Yen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in semiconductor device fabrication.

Latest Patents

Cheng-Ying Yen holds a patent titled "Method for fabricating semiconductor devices and a semiconductor device made therefrom." This patent outlines a comprehensive method for fabricating semiconductor devices, which includes several key steps. The process begins with forming a sacrificial film layer over a temporary substrate. It continues with the lateral and epitaxial growth of an epitaxial film layer. A patterned mask is then applied to partially cover the epitaxial film layer, defining through holes that expose various epitaxial surface regions. Conductive members are formed in these through holes and on the exposed epitaxial surface regions. The method concludes with the removal of the patterned mask, sacrificial film layer, and temporary substrate.

Career Highlights

Cheng-Ying Yen is affiliated with National Chung Hsing University, where he contributes to research and development in semiconductor technologies. His work has garnered attention for its innovative approach to semiconductor fabrication.

Collaborations

Cheng-Ying Yen has collaborated with notable colleagues, including Dong-Sing Wuu and Ray-Hua Horng. Their combined expertise has further advanced the research in semiconductor devices.

Conclusion

Cheng-Ying Yen's contributions to semiconductor fabrication highlight his role as an innovator in the field. His patented methods demonstrate a commitment to advancing technology and improving semiconductor device manufacturing processes.