Company Filing History:
Years Active: 2025
Title: Cheng-Wei Lo: Innovator in Deep Trench Capacitor Technology
Introduction: Cheng-Wei Lo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the design and formation of capacitor structures. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor devices.
Latest Patents: Cheng-Wei Lo holds a patent for a "Deep trench capacitor structure and method for forming the same." This patent describes a method that includes forming first-type deep trenches and second-type deep trenches in a substrate. The first-type deep trenches have a first lengthwise direction along a first direction, while the second-type deep trenches have a second lengthwise direction along a second direction. The patent also details the formation of a capacitor structure over the substrate and within the deep trenches, which includes a first metallic electrode layer, a node dielectric layer, and a second metallic electrode layer. Additionally, it describes the formation of a first metal via that contacts the second metallic electrode layer, with specific dimensions that enhance its functionality.
Career Highlights: Cheng-Wei Lo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.
Collaborations: Cheng-Wei Lo has worked alongside notable colleagues such as Fu-Chiang Kuo and Yu-Han Chen. Their combined expertise has fostered an environment of innovation and creativity within their projects.
Conclusion: Cheng-Wei Lo's contributions to the field of semiconductor technology, particularly through his patent on deep trench capacitors, highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements in semiconductor design and functionality.