Cheng-Lung Duan

Title: Cheng-Lung Duan: Innovator in Semiconductor Mask Manufacturing

Introduction

Cheng-Lung Duan is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of mask production. His innovative methods have paved the way for advancements in the industry.

Latest Patents

Cheng-Lung Duan holds a patent for a "Critical dimension controlled method of plasma descum for conventional quarter micron and smaller dimension binary mask manufacture." This patent outlines a method for forming a mask from a metal layer deposited on a substrate that is patterned for exposure to radiation. The process includes several steps, such as forming a metal layer, applying a photoresist layer, exposing and developing the photoresist, and performing a descum operation. The isotropic etching is conducted with a wet etchant, while the descum operation utilizes a dry plasma process involving oxygen, nitrogen, and an inert gas.

Career Highlights

Cheng-Lung Duan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the precision and efficiency of mask manufacturing processes. With a total of 1 patent, he has established himself as a key player in the field.

Collaborations

Cheng-Lung has collaborated with notable colleagues, including Tzy-Ying Lin and Tsung-Wen Tien. Their combined expertise contributes to the innovative projects at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Cheng-Lung Duan's contributions to semiconductor mask manufacturing demonstrate his commitment to innovation and excellence in the field. His patented methods are vital for advancing technology in the semiconductor industry.