Cheng-Hou Loh

Title: Cheng-Hou Loh: Innovator in Semiconductor Manufacturing

Introduction

Cheng-Hou Loh is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. His innovative approach has led to advancements in the methods used for forming shallow trench isolations, which are critical in the fabrication of integrated circuits.

Latest Patents

Cheng-Hou Loh holds a patent for a "Pre STI-CMP planarization scheme." This patent describes a new method of forming shallow trench isolations using a reverse mask process. The process involves depositing a polish stop layer on the surface of a substrate, followed by an etch stop layer over the polish stop layer. A series of isolation trenches are then etched through both layers into the substrate, creating narrow and wide active areas. An oxide layer is deposited over the etch stop layer and within the trenches, which is subsequently masked and etched away in the wide active areas. The mask is removed, and the etch stop layer is polished away to achieve a planarized oxide layer in the isolation trenches.

Career Highlights

Cheng-Hou Loh is currently employed at Chartered Semiconductor Manufacturing Ltd, where he applies his expertise in semiconductor technology. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Cheng-Hou Loh has collaborated with notable colleagues such as Feng Chen and Paul Proctor, contributing to various projects within the semiconductor industry.

Conclusion

Cheng-Hou Loh's innovative contributions to semiconductor manufacturing, particularly through his patented methods, highlight his role as a key figure in advancing technology in this field. His work continues to influence the industry and pave the way for future innovations.