This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2023-2024.
Company Filing History:
Years Active: 2023-2024
Title: Cheng-Han Yeh: Innovator in EUV Photolithography
Introduction
Cheng-Han Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of extreme ultraviolet (EUV) photolithography, particularly in the area of cleaning EUV masks. With a total of 2 patents, his work is crucial for advancing semiconductor manufacturing technologies.
Latest Patents
Cheng-Han Yeh's latest patents include a system and method for cleaning an EUV mask. This innovative system is designed to clean debris from an EUV reticle. It features a cleaning electrode that is positioned adjacent to the EUV reticle. The system utilizes a voltage source that draws debris toward the cleaning electrode by applying a voltage of alternating polarity. This method enhances the efficiency of the photolithography process, ensuring high-quality semiconductor production.
Career Highlights
Cheng-Han Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His expertise in EUV technology has positioned him as a key contributor to the company's advancements in photolithography.
Collaborations
Cheng-Han Yeh has collaborated with notable colleagues, including Yen-Hui Li and Tzung-Chi Fu. Their combined efforts in research and development have furthered the understanding and application of EUV technologies in the semiconductor field.
Conclusion
Cheng-Han Yeh's contributions to EUV photolithography and his innovative patents play a vital role in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.