Cheng-Fang Su

Title: Cheng-Fang Su: Innovator in Pixel Structure Technology

Introduction

Cheng-Fang Su is an inventor based in Taipei, Taiwan. He has made significant contributions to the field of pixel structure technology. His innovative approach focuses on the manufacturing methods that enhance the performance and efficiency of pixel structures.

Latest Patent Applications

Cheng-Fang Su has filed a patent application titled "PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF." This application outlines a manufacturing method for a pixel structure, which includes several steps. The process begins with the formation of a gate and a gate insulating layer on a substrate. Following this, a source and a drain are created on the gate insulating layer. A first and a second semiconductor pattern are then formed on the gate insulating layer, with the first semiconductor pattern positioned above the gate and in contact with the source and drain. The second semiconductor pattern also contacts the drain. A mask is applied to expose both sides of the first semiconductor pattern, allowing for a treatment procedure that results in the formation of a first and a second conductive region at both sides of the exposed first semiconductor pattern. The second semiconductor pattern is transformed into a pixel electrode pattern, while the first semiconductor pattern covered by the mask is shaped into a channel region.

Conclusion

Cheng-Fang Su's work in pixel structure technology showcases his innovative spirit and dedication to advancing manufacturing methods in this field. His contributions, particularly through his latest patent application, highlight the potential for improved pixel structures in various applications.