Tainan, Taiwan

Cheng-Chang Hung

This inventor holds 4 USPTO granted patents. Top assignee: Vanguard International Semiconductor Corporation. Active years: 1998-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cheng-Chang Hung. Retrieved from https://idiyas.com/inventor/cheng-chang-hung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1998-2000

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Cheng-Chang Hung: Innovator in Semiconductor Technology

Introduction

Cheng-Chang Hung is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes and systems that enhance production efficiency and product yield in semiconductor manufacturing.

Latest Patents

One of his latest inventions is the "Ammonium chloride vaporizer cold trap." This invention comprises means for sublimating and handling ammonium chloride (NH.sub.4 Cl) vapor, a by-product of a silicon nitride growth process. It effectively prevents backstreaming into the reactor and ingestion of vapor and particulates by the vacuum pump. The exhaust circuit features a novel combination of valves, sublimation and cold traps, as well as cooling and heating elements. This design facilitates the reduction of condensed NH.sub.4 Cl volume from a first path trap, thereby reducing maintenance, increasing production up-time, and enhancing product yield.

Another notable patent is the "Diffusion furnace system for preventing gas leakage." This furnace system includes a bottom board for holding a furnace tube. A gas injection device is connected to the furnace tube at a first port for injecting reaction gas into the furnace tube. An exhaust subsystem is connected to the furnace tube at a second port, featuring multiple nodes to ensure effective gas management. A vacuum seal is integrated to prevent exhaust gas from leaking, enhancing the overall efficiency of the system.

Career Highlights

Cheng-Chang Hung is currently employed at Vanguard International Semiconductor Corporation, where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in developing systems that improve manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Horng-Jong Wang and Yu-Cheng Su, to further enhance the research and development efforts within the company.

Conclusion

Cheng-Chang Hung's innovative contributions to semiconductor technology demonstrate his commitment to improving manufacturing processes and product efficiency. His patents reflect a deep understanding of the challenges in the industry and a dedication to finding effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…